Base Cleavage of Some Benzyl-Silicon and Tin Compounds in H2O-MeOH-Cyclodextrin Medium
dc.contributor.author | Foad M. S. Mahmoud | |
dc.date.accessioned | 2016-09-07T10:16:43Z | |
dc.date.available | 2016-09-07T10:16:43Z | |
dc.date.issued | 1987 | |
dc.description.abstract | The effects of oc - and f3- cyclodextrin (x - ,13- CD's) on the rates of base cleavage of 4 - CNC6 H4 SnMe3 ,3—CIC6 H4 CH2 MMe3 , 4 C1C6 H4 CH2— MMe3 and 3,5 - CL2 C6 H3 CH2 MMe3 with M = Si and Sn have been examined in H 2O - Me0H medium . oc - and 13-CD's accelerate the cleavage of the RSnMe3 compounds (R=3-0106 H4 CH2 , 4-0106 H4 CH2, and 3,5 - 01 2 C6H3 CH2 ) . There is no significant catalysis in the case of the corresponding silicon compounds. | en |
dc.identifier | 1727-2114 | |
dc.identifier.uri | http://hdl.handle.net/20.500.11888/1890 | |
dc.title | Base Cleavage of Some Benzyl-Silicon and Tin Compounds in H2O-MeOH-Cyclodextrin Medium | en |
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